High spatial resolution grain orientation and strain mapping in thin films 
using polychromatic submicron X-ray diffraction.

Tamura, N.; MacDowell, A. A.; Celestre, R. S.; Padmore, H. A.; Valek, B.; Bravman, J. C.; Spolenak, R.; Brown, W. L.; Marieb, T.; Fujimoto, H.; Batterman, B. W.; Patel, J. R.

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High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron X-ray diffraction.

Tamura, N., MacDowell, A. A., Celestre, R. S., Padmore, H. A., Valek, B., Bravman, J. C., et al. (2002). High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron X-ray diffraction. Applied Physics Letters, 80(20), 3724-3726.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-310A-C Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-310B-A

Genre: Journal Article

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Creators:
Tamura, N., Author
MacDowell, A. A., Author
Celestre, R. S., Author
Padmore, H. A., Author
Valek, B., Author
Bravman, J. C., Author
Spolenak, R.¹, Author
Brown, W. L., Author
Marieb, T., Author
Fujimoto, H., Author
Batterman, B. W., Author
Patel, J. R., Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2002-05-20

Publication Status: Issued

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Identifiers: eDoc: 55944

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 80 (20) Sequence Number: - Start / End Page: 3724 - 3726 Identifier: -