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  Electron energy-loss near-edge structure studies at the atomic level: reliability of the spatial difference technique

Scheu, C. (2002). Electron energy-loss near-edge structure studies at the atomic level: reliability of the spatial difference technique. Journal of Microscopy-Oxford, 207, 52-57.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-308C-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-308D-E
Genre: Journal Article
Alternative Title : J. Microsc.-Oxf.

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 Creators:
Scheu, C.1, Author           
Affiliations:
1Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              

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Free keywords: MPI für Metallforschung; Abt. Rühle; 60-ru_2002; EELS; ELNES; interfaces; spatial difference technique
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Language(s): eng - English
 Dates: 2002-07
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 6751
ISI: 000177026900006
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Title: Journal of Microscopy-Oxford
  Alternative Title : J. Microsc.-Oxf.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 207 Sequence Number: - Start / End Page: 52 - 57 Identifier: ISSN: 0022-2720