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  Structure and photoluminescence features of nanocrystalline Si/SiO2 films produced by plasma chemical vapor deposition and post-treatment

Wu, X. C., Ossadnik, C., Eggs, C., Veprek, S., & Phillipp, F. (2002). Structure and photoluminescence features of nanocrystalline Si/SiO2 films produced by plasma chemical vapor deposition and post-treatment. Journal of Vacuum Science & Technology B, 20(4), 1368-1378.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3089-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-308B-1
Genre: Journal Article
Alternative Title : J. Vac. Sci. Technol. B

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 Creators:
Wu, X. C.1, Author
Ossadnik, C.1, Author
Eggs, C.1, Author
Veprek, S.1, Author
Phillipp, F.2, Author           
Affiliations:
1Tech Univ Munich, Inst Chem Inorgan Mat, Lichtenbergstr 4, D-; 85747 Garching, Germany;, ou_persistent22              
2Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, DE, ou_1497657              

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Free keywords: MPI für Metallforschung; Abt. Rühle; ZWE Hochspannungs-Mikroskopie; 72-ru_2002;
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Language(s): eng - English
 Dates: 2002-07
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 6728
ISI: 000177510500016
 Degree: -

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Title: Journal of Vacuum Science & Technology B
  Alternative Title : J. Vac. Sci. Technol. B
Source Genre: Journal
 Creator(s):
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Publ. Info: -
Pages: - Volume / Issue: 20 (4) Sequence Number: - Start / End Page: 1368 - 1378 Identifier: ISSN: 1071-1023