Self-diffusion of 31Si and 71Ge in relaxed Si0.20Ge0.80 layers

Laitinen, P.; Strohm, A.; Huikari, J.; Nieminen, A.; Voss, T.; Grodon, C.; Riihimäki, I.; Kummer, M.; Äystö, J.; Dendooven, P.; Räisänen, J.; Frank, W.

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Self-diffusion of ³¹Si and ⁷¹Ge in relaxed Si_0.20Ge_0.80 layers

Laitinen, P., Strohm, A., Huikari, J., Nieminen, A., Voss, T., Grodon, C., et al. (2002). Self-diffusion of ³¹Si and ⁷¹Ge in relaxed Si_0.20Ge_0.80 layers. Physical Review Letters, 89(8): 085902.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-301F-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-3020-F

Genre: Journal Article

Alternative Title : Phys. Rev. Lett.

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23-di_2002.pdf (Abstract), 6KB

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Creators:
Laitinen, P.¹, Author
Strohm, A.², Author
Huikari, J.¹, Author
Nieminen, A.¹, Author
Voss, T.², Author
Grodon, C.², Author
Riihimäki, I.¹, Author
Kummer, M.¹, Author
Äystö, J.¹, Author
Dendooven, P.¹, Author
Räisänen, J.¹, Author
Frank, W.³, Author

Affiliations:
1Univ Jyvaskyla, Dept Phys, POB 35, FIN-40351 Jyvaskyla, Finland; Univ Stuttgart, Inst Theoret & Angew Phys, D-70550 Stuttgart, Germany; ETH Honggerberg, Festkorperphys Lab, CH-8093 Zurich, Switzerland, ou_persistent22
2Dept. Theory of Inhomogeneous Condensed Matter, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497643
3Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645

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Free keywords: MPI für Metallforschung; Abt. Dietrich; Miscellaneous; 23-di_2002;

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Language(s): eng - English

Dates: Date issued: 2002-08-19

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 6735
ISI: 000177338700036

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Title: Physical Review Letters

Alternative Title : Phys. Rev. Lett.

Source Genre: Journal

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Pages: - Volume / Issue: 89 (8) Sequence Number: 085902 Start / End Page: - Identifier: ISSN: 0031-9007