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  Chemical reactions and morphological stability at the Cu/Al2O3 interface

Scheu, C., Klein, S., Tomsia, A. P., & Rühle, M. (2002). Chemical reactions and morphological stability at the Cu/Al2O3 interface. Journal of Microscopy-Oxford, 208, 11-17.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2FE3-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2FE4-F
Genre: Journal Article
Alternative Title : J. Microsc.-Oxf.

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 Creators:
Scheu, C.1, Author           
Klein, S.1, Author           
Tomsia, A. P.1, Author           
Rühle, M.1, Author           
Affiliations:
1Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              

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Free keywords: MPI für Metallforschung; Abt. Rühle; 62-ru_2002; Cu/Al2O3; diffusion bonding; interfaces; reaction phases; TEM
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Language(s): eng - English
 Dates: 2002-10
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 6690
ISI: 000178482900003
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Title: Journal of Microscopy-Oxford
  Alternative Title : J. Microsc.-Oxf.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 208 Sequence Number: - Start / End Page: 11 - 17 Identifier: ISSN: 0022-2720