Sputter depth profiling in AES and XPS

Wagner, T.; Wang, J. Y.; Hofmann, S.

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Sputter depth profiling in AES and XPS

Wagner, T., Wang, J. Y., & Hofmann, S. (2003). Sputter depth profiling in AES and XPS. In D. Briggs, & J. Grant (Eds.), Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy (pp. 619-649). Chichester: IM Publications.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2DDD-D Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2DDE-B

Genre: Book Chapter

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Creators:
Wagner, T.¹, Author
Wang, J. Y.², Author
Hofmann, S.², Author

Affiliations:
1Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640
2Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644

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Free keywords: MPI für Metallforschung; Abt. Arzt; Abt. Mittemeijer; ZWE Dünnschichtlabor; sputter depth profiling; AES; XPS; electron spectroscopy; MRI model

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Identifiers: eDoc: 51200

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Title: Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy

Source Genre: Book

Creator(s):
Briggs, D., Editor
Grant, J., Editor

Affiliations:
-

Publ. Info: Chichester : IM Publications

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 619 - 649 Identifier: -