Diffusion corrected simultaneous multilayer growth model

Fu, Q.; Wagner, T.

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Diffusion corrected simultaneous multilayer growth model

Fu, Q., & Wagner, T. (2003). Diffusion corrected simultaneous multilayer growth model. Physical Review Letter, 90: 1061054.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2DD2-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2DD3-1

Genre: Journal Article

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Creators:
Fu, Q.¹, Author
Wagner, T.², Author

Affiliations:
1Former Dept. Materials Synthesis and Microstructure Design, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497654
2Central Scientific Facility Thin Film Laboratory, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497640

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Free keywords: MPI für Metallforschung; Abt. Arzt; ZWE Dünnschichtlabor; growth model; AES; thin film; rate equations

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Language(s): eng - English

Dates: Date issued: 2003

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 51192

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Title: Physical Review Letter

Source Genre: Journal

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Pages: - Volume / Issue: 90 Sequence Number: 1061054 Start / End Page: - Identifier: -