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  Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vaccum

Zhao, Y. H., Wang, J. Y., & Mittemeijer, E. J. (2003). Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vaccum. Thin Solid Films, 433, 82-87.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2D76-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2D77-F
Genre: Journal Article

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313.pdf (Abstract), 80KB
 
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 Creators:
Zhao, Y. H.1, Author           
Wang, J. Y.1, Author           
Mittemeijer, E. J.1, 2, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer;
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Language(s): eng - English
 Dates: 2003
 Publication Status: Issued
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 Identifiers: eDoc: 47151
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Title: Thin Solid Films
Source Genre: Journal
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Pages: - Volume / Issue: 433 Sequence Number: - Start / End Page: 82 - 87 Identifier: -