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  Morphology and interdiffusion behavior of evaporated metal films on crystalline diindenoperylene thin films

Dürr, A. C., Schreiber, F., Kelsch, M., Carstanjen, H. D., Dosch, H., & Seeck, O. H. (2003). Morphology and interdiffusion behavior of evaporated metal films on crystalline diindenoperylene thin films. Journal of Applied Physics, 93(9), 5201-5209.

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 Creators:
Dürr, A. C.1, Author           
Schreiber, F.2, Author           
Kelsch, M.3, 4, Author           
Carstanjen, H. D.5, 6, Author           
Dosch, H.1, 7, Author           
Seeck, O. H.8, Author
Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645              
2Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
3Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657              
4Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
5Former Central Scientific Facility Pelletron Accelerator, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497653              
6Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648              
7Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22              
8Institut für Angewandte und Theoretische Physik, Universität Stuttgart, Pfaffenwaldring 57, 70550 Stuttgart, IFF, FZ Jülich GmbH, 52425 Jülich, Hasylab at DESY, Notkestrasse 85, 22603 Hamburg, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Dosch; Abt. Rühle; Abt. Schütz; ZWE Hochspannungs-Mikroskopie; ZWE Peletron-Beschleuniger;
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Language(s): eng - English
 Dates: 2003-05-01
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 49867
 Degree: -

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Title: Journal of Applied Physics
Source Genre: Journal
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Pages: - Volume / Issue: 93 (9) Sequence Number: - Start / End Page: 5201 - 5209 Identifier: -