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  Early stage of plastic deformation in thin films undergoing electromigration

Valek, B. C., Tamura, N., Spolenak, R., Caldwell, W. A., MacDowell, A. A., Celestre, R. S., et al. (2003). Early stage of plastic deformation in thin films undergoing electromigration. Journal of Applied Physics, 94(6), 3757-3761.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2C48-3 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2C49-1
Genre: Journal Article
Alternative Title : J. Appl. Phys.

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 Creators:
Valek, B. C.1, Author
Tamura, N.1, Author
Spolenak, R.2, Author           
Caldwell, W. A.1, Author
MacDowell, A. A.1, Author
Celestre, R. S.1, Author
Padmore, H. A.1, Author
Braman, J. C.1, Author
Batterman, B. W.1, Author
Nix, W. D.1, Author
Patel, J. R.1, Author
Affiliations:
1Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA.; Adv Light Source, Berkeley, CA 94720 USA.; Stanford Univ, SSRL SLAC, Menlo Pk, CA 94025 USA., ou_persistent22              
2Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655              

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Free keywords: MPI für Metallforschung; Abt. Arzt;
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Language(s): eng - English
 Dates: 2003-09-15
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 112766
ISI: 000185419600010
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Title: Journal of Applied Physics
  Alternative Title : J. Appl. Phys.
Source Genre: Journal
 Creator(s):
Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 94 (6) Sequence Number: - Start / End Page: 3757 - 3761 Identifier: ISSN: 0021-8979