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  A New Method for the Determination of the Diffusion-Induced Concentration Profile and the Interdiffusion Coefficient for Thin Film Systems by Auger Electron Spectroscopical Sputter Depth Profiling

Wang, J., & Mittemeijer, E. (2004). A New Method for the Determination of the Diffusion-Induced Concentration Profile and the Interdiffusion Coefficient for Thin Film Systems by Auger Electron Spectroscopical Sputter Depth Profiling. Journal of Materials Research, 19, 3389-3397.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2B8A-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2B8B-4
Genre: Journal Article

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 Creators:
Wang, J.Y.1, Author           
Mittemeijer, E.J.1, 2, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Universität Stuttgart, Institut für Materialwissenschaft, ou_persistent22              

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Free keywords: MPI für Metallforschung; Abt. Mittemeijer;
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Language(s): eng - English
 Dates: 2004
 Publication Status: Issued
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 Rev. Type: -
 Identifiers: eDoc: 207076
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Title: Journal of Materials Research
Source Genre: Journal
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Pages: - Volume / Issue: 19 Sequence Number: - Start / End Page: 3389 - 3397 Identifier: -