X-ray microdiffraction: Local stress distribution in polycrystalline and 
epitaxial thin films

Phillips, M. A.; Spolenak, R.; Tamura, N.; Brown, W. L.; MacDowell, A. A.; Celestre, R. C.; Padmore, H. A.; Batterman, B. W.; Arzt, E.; Patel, J. R.

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X-ray microdiffraction: Local stress distribution in polycrystalline and epitaxial thin films

Phillips, M. A., Spolenak, R., Tamura, N., Brown, W. L., MacDowell, A. A., Celestre, R. C., et al. (2004). X-ray microdiffraction: Local stress distribution in polycrystalline and epitaxial thin films. Microelectronic Engineering, 75, 117-126.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2976-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2977-2

Genre: Journal Article

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Creators:
Phillips, M. A.¹, Author
Spolenak, R.¹, Author
Tamura, N.², Author
Brown, W. L.², Author
MacDowell, A. A.², Author
Celestre, R. C.², Author
Padmore, H. A.², Author
Batterman, B. W.², Author
Arzt, E.^{1, 3}, Author
Patel, J. R.², Author

Affiliations:
1Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655
2Advanced Light Source, LBNL, 1 Cyclotron Road, Berkeley, CA 94720, USA; Department of Materials Science and Engineering, Lehigh University, Bethlehem, PA 18015, USA; SSRL/SLAC, Stanford University, P.O. Box 43459, Stanford, CA 94309, USA Department of Materials Science and Engineering, Stanford University, Stanford, CA 94305, USA, ou_persistent22
3Universität Stuttgart, Institut für Metallkunde, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2004-02-26

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 125007

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Title: Microelectronic Engineering

Source Genre: Journal

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Pages: - Volume / Issue: 75 Sequence Number: - Start / End Page: 117 - 126 Identifier: -