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  Efficient formation and cleavage of disilanes by potassium-graphite. Silylation with silyl metal reagents

Fürstner, A., & Weidmann, H. (1988). Efficient formation and cleavage of disilanes by potassium-graphite. Silylation with silyl metal reagents. Journal of Organometallic Chemistry, 354(1), 15-21. doi:10.1016/0022-328X(88)80634-X.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-259D-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-5982-7
Genre: Journal Article

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 Creators:
Fürstner, Alois1, Author           
Weidmann, Hans1, Author
Affiliations:
1Institute of Organic Chemistry, Technical University Graz, ou_persistent22              

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 Abstract: Potassium-graphite laminate (C8K) very rapidly forms disilanes from chlorosilanes and then rapidly cleaves the disilanes to give silyl potassium reagents which can be converted into potassium silyl cuprates, -manganates, and -vanadates that are useful for nucleophilic substitution and addition reactions.

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Language(s): eng - English
 Dates: 1988-04-081988-10-11
 Publication Status: Issued
 Pages: 7
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1016/0022-328X(88)80634-X
 Degree: -

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Title: Journal of Organometallic Chemistry
Source Genre: Journal
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Publ. Info: Amsterdam : Elsevier
Pages: 7 Volume / Issue: 354 (1) Sequence Number: - Start / End Page: 15 - 21 Identifier: ISSN: 0022-328X
CoNE: https://pure.mpg.de/cone/journals/resource/954925622228
DOI: 10.1016/0022-328X(88)80634-X