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  Thin silica films on Ru(0001): monolayer, bilayer and three-dimensional networks of [SiO4] tetrahedra

Yang, B., Kaden, W., Yu, X., Boscoboinik, A., Martynova, Y., Lichtenstein, L., et al. (2012). Thin silica films on Ru(0001): monolayer, bilayer and three-dimensional networks of [SiO4] tetrahedra. Physical Chemistry Chemical Physics, 14(32), 11344-11351. doi:10.1039/c2cp41355h.

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 Creators:
Yang, Bing1, Author           
Kaden, William1, Author           
Yu, Xin1, Author           
Boscoboinik, Anibal1, Author           
Martynova, Yulia1, Author           
Lichtenstein, Leonid1, Author           
Heyde, Markus1, Author           
Sterrer, Martin1, Author           
Włodarczyk, Radosław2, Author
Sierka, Marek2, 3, Author
Sauer, Joachim2, Author
Shaikhutdinov, Shamil Kamilovich1, Author           
Freund, Hans-Joachim1, Author           
Affiliations:
1Chemical Physics, Fritz Haber Institute, Max Planck Society, ou_24022              
2Institut für Chemie, Humboldt-Universität zu Berlin, Brook-Taylor-Strabe 2, 12489 Berlin, Germany., ou_persistent22              
3Institut für Materialwissenschaft und Werkstofftechnologie, Friedrich-Schiller-Universität Jena, Löbdergraben 32, 07743 Jena, Germany, ou_persistent22              

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 Abstract: The atomic structure of thin silica films grown over a Ru(0001) substrate was studied by X-ray photoelectron spectroscopy, infrared reflection absorption spectroscopy, low energy electron diffraction, helium ion scattering spectroscopy, CO temperature programmed desorption, and scanning tunneling microscopy in combination with density functional theory calculations. The films were prepared by Si vapor deposition and subsequent oxidation at high temperatures. The silica film first grows as a monolayer of corner-sharing [SiO4] tetrahedra strongly bonded to the Ru(0001) surface through the Si–O–Ru linkages. At increasing amounts of Si, the film forms a bilayer of corner-sharing [SiO4] tetrahedra which is weakly bonded to Ru(0001). The bilayer film can be grown in either the crystalline or vitreous state, or both coexisting. Further increasing the film thickness leads to the formation of vitreous silica exhibiting a three-dimensional network of [SiO4]. The principal structure of the films can be monitored by infrared spectroscopy, as each structure shows a characteristic vibrational band, i.e., [similar]1135 cm-1 for a monolayer film, [similar]1300 cm⁻-1 for the bilayer structures, and [similar]1250 cm⁻-1 for the bulk-like vitreous silica.

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Language(s): eng - English
 Dates: 2012-04-272012-06-262012-07-162012-08-28
 Publication Status: Issued
 Pages: 8
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1039/c2cp41355h
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Title: Physical Chemistry Chemical Physics
Source Genre: Journal
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Publ. Info: Cambridge [England] : Royal Society of Chemistry
Pages: - Volume / Issue: 14 (32) Sequence Number: - Start / End Page: 11344 - 11351 Identifier: ISSN: 1463-9076
CoNE: https://pure.mpg.de/cone/journals/resource/954925272413_1