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  Hafnium oxide thin films deposited by reactive middle-frequency dual-magnetron sputtering

Pervak, V., Krausz, F., & Apolonskiy, A. (2007). Hafnium oxide thin films deposited by reactive middle-frequency dual-magnetron sputtering. Thin Solid Films, 515(20-21), 7984-7989. doi:10.1016/j.tsf.2007.03.180.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-B765-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-B766-D
Genre: Journal Article

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3433.pdf (Publisher version), 787KB
 
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 Creators:
Pervak, Volodymyr1, Author           
Krausz, Ferenc1, Author           
Apolonskiy, Alexander1, Author           
Affiliations:
1Laboratory for Attosecond Physics, Max Planck Institute of Quantum Optics, Max Planck Society, ou_1445564              

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Free keywords: deposition process; optical coatings; hafnium
 Abstract: -

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Language(s): eng - English
 Dates: 2007-07-31
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 320877
URI: http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TW0-4NG3T6P-2&_user=1986402&_coverDate=07%2F31%2F2007&_rdoc=1&_fmt=&_orig=search&_sort=d&view=c&_acct=C000004919&_version=1&_urlVersion=0&_userid=1986402&md5=97c9a53db71402e96d94a01030666f84
DOI: 10.1016/j.tsf.2007.03.180
Other: 3433
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Title: Thin Solid Films
  Alternative Title : Thin Solid Films
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 515 (20-21) Sequence Number: - Start / End Page: 7984 - 7989 Identifier: -