Surface Film Formation by Chemical Vapor Deposition of Di-p-xylylene: 
Ellipsometrical, Atomic Force Micrsocopy, and X-Ray Studies

Göschel, U.; Walter, H.

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Surface Film Formation by Chemical Vapor Deposition of Di-p-xylylene: Ellipsometrical, Atomic Force Micrsocopy, and X-Ray Studies

Göschel, U., & Walter, H. (2000). Surface Film Formation by Chemical Vapor Deposition of Di-p-xylylene: Ellipsometrical, Atomic Force Micrsocopy, and X-Ray Studies. Langmuir, 16, 2887-2892.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-6ACD-A Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-6ACE-8

Genre: Journal Article

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Creators:
Göschel, U., Author
Walter, H.¹, Author

Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545

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Language(s): eng - English

Dates: Date issued: 2000

Publication Status: Issued

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Identifiers: eDoc: 286239
Other: P-00-194

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Title: Langmuir

Source Genre: Journal

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Pages: - Volume / Issue: 16 Sequence Number: - Start / End Page: 2887 - 2892 Identifier: -