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  In-situ thin film diagnostics using waveguide mode spectroscopy

Jacobsen, V., Menges, B., Förch, R., Mittler, S., & Knoll, W. (2002). In-situ thin film diagnostics using waveguide mode spectroscopy. Thin Solid Films, 409(2), 185-193.

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 Creators:
Jacobsen, V.1, Author           
Menges, B.1, Author           
Förch, Renate1, Author           
Mittler, Silvia1, Author           
Knoll, Wolfgang1, Author           
Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545              

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Free keywords: in-situ process control; plasma polymerisation; thin film depositions; grating coupler
 Abstract: A new method for in-situ film characterisation during thin film deposition processes was developed using waveguide mode spectroscopy. The advantages of the method are a high sensitivity for thin films in the nm-regime and a relatively simple and low-cost set-up. The detection method relies on a double grating coupler allowing a background-free detection of the propagation constants of guided optical modes. The set-up is based on a reflected mode m-line geometry requiring no moving parts. The method was applied to thin film diagnostics in plasma-assisted deposition processes and allowed for the simultaneous determination of thickness and refractive index of the plasma polymer film during deposition. The in-situ waveguide mode spectrometer was also used to monitor gas phase reactions of plasma polymerised maleic anhydride thin films on- line. (C) 2002 Elsevier Science B.V. All rights reserved.

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Language(s): eng - English
 Dates: 2002-04-30
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: No review
 Identifiers: eDoc: 28340
ISI: 000176019900004
Other: P-02-77
 Degree: -

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Title: Thin Solid Films
  Alternative Title : Thin Solid Films
Source Genre: Journal
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Affiliations:
Publ. Info: -
Pages: - Volume / Issue: 409 (2) Sequence Number: - Start / End Page: 185 - 193 Identifier: ISSN: 0040-6090