Variations in the Film Chemistry of Pulsed RF Plasma Deposited Allylamine

van Os, M. T.; Menges, B.; Timmons, R. B.; Knoll, Wolfgang; Foerch, Renate

Local TagsRelease HistoryDetailsSummary

Variations in the Film Chemistry of Pulsed RF Plasma Deposited Allylamine

van Os, M. T., Menges, B., Timmons, R. B., Knoll, W., & Foerch, R. (1997). Variations in the Film Chemistry of Pulsed RF Plasma Deposited Allylamine. In C. K. Wu (Ed.), 13th International Symposium on Plasma Chemistry. Beijing, China, 1997/8/18-22 (pp. 1298-1303). China: Peking University Press.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5A1B-E Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5A1C-C

Genre: Book Chapter

Files

show Files

Locators

show

Creators

show

hide

Creators:
van Os, M. T., Author
Menges, B.¹, Author
Timmons, R. B., Author
Knoll, Wolfgang¹, Author
Foerch, Renate¹, Author

Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545

Content

show

Details

show

hide

Language(s): eng - English

Dates: Date issued: 1997

Publication Status: Issued

Pages: -

Publishing info: China : Peking University Press

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 438007
Other: P-97-168

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: 13th International Symposium on Plasma Chemistry. Beijing, China, 1997/8/18-22

Source Genre: Book

Creator(s):
Wu, C. K., Editor

Affiliations:
-

Publ. Info: China : Peking University Press

Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 1298 - 1303 Identifier: -