Highly sensitive resist material for deep X-ray lithography

Schenk, R.; Halle, O.; Müllen, Klaus; Ehrfeld, W.; Schmidt, M.

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Highly sensitive resist material for deep X-ray lithography

Schenk, R., Halle, O., Müllen, K., Ehrfeld, W., & Schmidt, M. (1997). Highly sensitive resist material for deep X-ray lithography. Microelectronic Engineering, 35(1-4), 105-108.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5A02-4 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-5A03-2

Genre: Journal Article

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Creators:
Schenk, R., Author
Halle, O., Author
Müllen, Klaus¹, Author
Ehrfeld, W., Author
Schmidt, M.¹, Author

Affiliations:
1MPI for Polymer Research, Max Planck Society, ou_1309545

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Language(s): eng - English

Dates: Date issued: 1997

Publication Status: Issued

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Identifiers: eDoc: 436483
Other: P-97-52

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Title: Microelectronic Engineering

Alternative Title : Microelectron. Eng.

Source Genre: Journal

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Pages: - Volume / Issue: 35 (1-4) Sequence Number: - Start / End Page: 105 - 108 Identifier: -