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  Feature Sensitive Bas Relief Generation

Kerber, J., Tevs, A., Zayer, R., Belyaev, A., & Seidel, H.-P. (2009). Feature Sensitive Bas Relief Generation. In J.-H. Yong, M. Spagnuolo, & W. Wang (Eds.), IEEE International Conference on Shape Modeling and Applications Proceedings (pp. 148-154). Washington, USA: IEEE Computer Society Press.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-19AD-0 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-19AE-E
Genre: Conference Paper

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Jens_Kerber_SMI_2009.pdf (Any fulltext), 2MB
 
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 Creators:
Kerber, Jens1, Author           
Tevs, Art1, 2, Author           
Zayer, Rhaleb1, Author           
Belyaev, Alexander1, Author           
Seidel, Hans-Peter1, Author           
Affiliations:
1Computer Graphics, MPI for Informatics, Max Planck Society, ou_40047              
2International Max Planck Research School, MPI for Informatics, Max Planck Society, ou_1116551              

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 Abstract: Among all forms of sculpture, bas-relief is arguably the closest to painting. Although inherently a two dimensional sculpture, a bas-relief suggests a visual spatial extension of the scene in depth through the combination of composition, perspective, and shading. Most recently, there have been significant results on digital bas-relief generation but many of the existing techniques may wash out high level surface detail during the compression process. The primary goal of this work is to address the problem of fine features by tailoring a filtering technique that achieves good compression without compromising the quality of surface details. As a secondary application we explore the generation of artistic relief which mimic cubism in painting and we show how it could be used for generating Picasso like portraits.

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Language(s): eng - English
 Dates: 2009-09-212009
 Publication Status: Issued
 Pages: -
 Publishing info: Washington, USA : IEEE Computer Society Press
 Table of Contents: -
 Rev. Type: -
 Identifiers: eDoc: 520477
URI: http://www.mpi-inf.mpg.de/~kerber/publications/Jens_Kerber_SMI_2009.pdf
Other: Local-ID: C125675300671F7B-8F2AFB7CFC9176DFC12575F6003BAF29-Kerber_SMI2009
 Degree: -

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Title: Untitled Event
Place of Event: Beijing, China
Start-/End Date: 2009-06-26 - 2009-06-28

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Title: IEEE International Conference on Shape Modeling and Applications Proceedings
Source Genre: Proceedings
 Creator(s):
Yong, Jun-Hai, Editor
Spagnuolo, Michela, Editor
Wang, Wenping, Editor
Affiliations:
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Publ. Info: Washington, USA : IEEE Computer Society Press
Pages: - Volume / Issue: - Sequence Number: - Start / End Page: 148 - 154 Identifier: ISBN: 978-1-4244-4068-9