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  On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition

Weatherup, R. S., Bayer, B. C., Blume, R., Baehtz, C., Kidambi, P. R., Fouquet, M., et al. (2012). On the Mechanisms of Ni-Catalysed Graphene Chemical Vapour Deposition. ChemPhysChem, 13(10), 2544-2549. doi:10.1002/cphc.201101020.

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 Creators:
Weatherup, Robert S.1, Author
Bayer, Bernhard C.1, Author
Blume, Raoul2, Author           
Baehtz, Carsten3, Author
Kidambi, Piran R.1, Author
Fouquet, Martin1, Author
Wirth, Christoph T.1, Author
Schlögl, Robert4, Author           
Hofmann, Stephan1, Author
Affiliations:
1Department of Engineering University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, United Kingdom, ou_persistent22              
2Abt. Solarenergieforschung, Helmhotz-Zentrum Berlin, ou_persistent22              
3Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum, 01314 Dresden, Germany, ou_persistent22              
4Inorganic Chemistry, Fritz Haber Institute, Max Planck Society, ou_24023              

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Free keywords: graphene; chemical vapor deposition; photoelectron spectroscopy; X-ray diffraction; nickel
 Abstract: How does your graphene grow? In situ X-ray photoelectron spectroscopy and X-ray diffraction measurements during chemical vapor deposition on Ni catalyst films show that graphene forms both isothermally and by precipitation on cooling (see picture). A coherent graphene growth model is devised and sub-surface dissolved carbon is shown to play an important role.

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Language(s): eng - English
 Dates: 2012-01-102012-02-29
 Publication Status: Published online
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 Rev. Type: Peer
 Identifiers: DOI: 10.1002/cphc.201101020
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Title: ChemPhysChem
Source Genre: Journal
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Publ. Info: Weinheim, Germany : Wiley-VCH
Pages: - Volume / Issue: 13 (10) Sequence Number: - Start / End Page: 2544 - 2549 Identifier: ISSN: 1439-4235
CoNE: https://pure.mpg.de/cone/journals/resource/954925409790