Microstructure and intrinsic stress evolution during epitaxial film growth of 
an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to 
quantum confinement

Flötotto, David; Wang, Z. M.; Markel, Ingo; Kurz, Silke; Mittemeijer, Eric Jan

doi:10.1063/1.4964945

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Microstructure and intrinsic stress evolution during epitaxial film growth of an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to quantum confinement

Flötotto, D., Wang, Z. M., Markel, I., Kurz, S., & Mittemeijer, E. J. (2016). Microstructure and intrinsic stress evolution during epitaxial film growth of an Ag0.93Al0.07 solid solution on Si(111); excessive planar faulting due to quantum confinement. Journal of Applied Crystallography, 120(15): 155305. doi:10.1063/1.4964945.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-1BF6-8 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-002D-1D10-5

Genre: Journal Article

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Creators:
Flötotto, David¹, Author
Wang, Z. M.², Author
Markel, Ingo¹, Author
Kurz, Silke¹, Author
Mittemeijer, Eric Jan^{1, 3}, Author

Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
2School of Materials Science and Engineering, Tianjin University, Tianjin 300350, China, ou_persistent22
3Institut für Materialwissenschaft, Universität Stuttgart, Heisenbergstraße 3, 70569 Stuttgart, Germany, ou_persistent22

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Free keywords: Abt. Mittemeijer

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Language(s): eng - English

Dates: Published Online: 2016-10-20Date issued: 2016

Publication Status: Issued

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Rev. Type: Peer

Identifiers: DOI: 10.1063/1.4964945

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Title: Journal of Applied Crystallography

Abbreviation : J. Appl. Cryst.

Source Genre: Journal

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Publ. Info: Oxford, England : Blackwell Publishing on behalf of the International Union of Crystallography

Pages: - Volume / Issue: 120 (15) Sequence Number: 155305 Start / End Page: - Identifier: ISSN: 0021-8898
CoNE: https://pure.mpg.de/cone/journals/resource/954925410812