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Zusammenfassung:
We use tunable UV laser light in the region 200–320 nm, produced by frequency doubling the output of a dye laser, for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum Al(CH3)3. Only the TMA monomer absorbs UV light for λ >220 nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum atoms Al plus organic fragments, and aluminummonomethyl AlCH3 molecules plus organic fragments. The ratio [Al]/[AlCH3] is wavelength dependent. We present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al, Ga, In).
