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  Single and multiple profile fitting of AES and XPS intensity-depth profiles for analysis of interdiffusion in thin films

Noah, M., Flötotto, D., Wang, Z., & Mittemeijer, E. J. (2014). Single and multiple profile fitting of AES and XPS intensity-depth profiles for analysis of interdiffusion in thin films. Surface and Interface Analysis, 46, 1057-1063. doi:10.1002/sia.5369.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-AFF5-2 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0024-AFF6-F
Genre: Journal Article

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 Creators:
Noah, Martin1, Author           
Flötotto, David1, Author           
Wang, Zumin1, Author           
Mittemeijer, Eric Jan1, 2, Author           
Affiliations:
1Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644              
2Institut für Materialwissenschaft, Universität Stuttgart, ou_persistent22              

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Free keywords: Abt. Mittemeijer
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Language(s): eng - English
 Dates: 2014
 Publication Status: Issued
 Pages: -
 Publishing info: -
 Table of Contents: -
 Rev. Type: Peer
 Identifiers: DOI: 10.1002/sia.5369
 Degree: -

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Title: Surface and Interface Analysis
Source Genre: Journal
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Publ. Info: New York, NY : John Wiley & Sons
Pages: - Volume / Issue: 46 Sequence Number: - Start / End Page: 1057 - 1063 Identifier: ISSN: 0142-2421
CoNE: https://pure.mpg.de/cone/journals/resource/954925471358