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  Atom lithography with subwavelength resolution via Rabi oscillations

Liao, Z., Al-Amri, M., Becker, T., Schleich, W. P., Scully, M. O., & Zubairy, M. S. (2013). Atom lithography with subwavelength resolution via Rabi oscillations. Physical Review A, 87(2): 023405. doi:10.1103/PhysRevA.87.023405.

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 Creators:
Liao, Zeyang1, Author
Al-Amri, M.1, Author
Becker, Thomas2, Author           
Schleich, W. P.1, Author
Scully, Marlan O.1, Author
Zubairy, M. Suhail1, Author
Affiliations:
1external, ou_persistent22              
2Laser Spectroscopy, Max Planck Institute of Quantum Optics, Max Planck Society, Hans-Kopfermann-Str. 1, 85748 Garching, DE, ou_1445568              

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Language(s): eng - English
 Dates: 20132013-02-13
 Publication Status: Issued
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 Rev. Type: Peer
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Title: Physical Review A
  Other : Phys. Rev. A
Source Genre: Journal
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Publ. Info: New York, NY : Published by the American Physical Society through the American Institute of Physics
Pages: - Volume / Issue: 87 (2) Sequence Number: 023405 Start / End Page: - Identifier: ISSN: 1050-2947
CoNE: https://pure.mpg.de/cone/journals/resource/954925225012_2