Compression of stacked niobium bilayers: void-induced strain localisation at 
interfaces

Liu, Y.; Brunner, D.; Rühle, M.

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Compression of stacked niobium bilayers: void-induced strain localisation at interfaces

Liu, Y., Brunner, D., & Rühle, M. (2006). Compression of stacked niobium bilayers: void-induced strain localisation at interfaces. Applied Physics Letters, 89: 141909.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-488E-5 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-488F-3

Genre: Journal Article

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Creators:
Liu, Y.¹, Author
Brunner, D.², Author
Rühle, M.², Author

Affiliations:
1Institut für Physik und Zentrum für Mikro- und Nanotechnologien, Technische Universität Ilmenau, 98693 Ilmenau, Germany, ou_persistent22
2Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497650

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Free keywords: MPI für Metallforschung; Emeriti and Others;

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Language(s): eng - English

Dates: Date issued: 2006

Publication Status: Issued

Pages: (3 pages)

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Rev. Type: Peer

Identifiers: eDoc: 318212

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Title: Applied Physics Letters

Source Genre: Journal

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Pages: - Volume / Issue: 89 Sequence Number: 141909 Start / End Page: - Identifier: -