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  Grain-boundary plane orientation dependence of electrical barriers at Σ5 boundaries in SrTiO3

Lee, S. B., Lee, J.-H., Cho, Y.-H., Kim, D.-Y., Sigle, W., Phillipp, F., et al. (2008). Grain-boundary plane orientation dependence of electrical barriers at Σ5 boundaries in SrTiO3. Acta Materialia, 56, 4993-4997.

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 Creators:
Lee, S. B.1, Author           
Lee, J.-H.2, Author
Cho, Y.-H.2, Author
Kim, D.-Y.2, Author
Sigle, W.1, Author           
Phillipp, F.1, Author           
van Aken, P. A.1, Author           
Affiliations:
1Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669              
2School of Materials Science and Engineering, Seoul National University, Seoul, South Korea;Department of Materials Science and Engineering, Korea University, Seoul, South Korea, ou_persistent22              

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Free keywords: MPI für Metallforschung; Stuttgart Center for Electron Microscopy (StEM);
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Language(s): eng - English
 Dates: 2008
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 379418
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Title: Acta Materialia
Source Genre: Journal
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Pages: - Volume / Issue: 56 Sequence Number: - Start / End Page: 4993 - 4997 Identifier: -