Morphology and interdiffusion behavior of evaporated metal films on crystalline 
diindenoperylene thin films

Dürr, A. C.; Schreiber, F.; Kelsch, M.; Carstanjen, H. D.; Dosch, H.; Seeck, O. H.

Local TagsRelease HistoryDetailsSummary

Morphology and interdiffusion behavior of evaporated metal films on crystalline diindenoperylene thin films

Dürr, A. C., Schreiber, F., Kelsch, M., Carstanjen, H. D., Dosch, H., & Seeck, O. H. (2003). Morphology and interdiffusion behavior of evaporated metal films on crystalline diindenoperylene thin films. Journal of Applied Physics, 93(9), 5201-5209.

Item is Released

show all hide all

Basic

show hide

Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2CB3-F Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2CB4-D

Genre: Journal Article

Files

show Files

Locators

show

Creators

show

hide

Creators:
Dürr, A. C.¹, Author
Schreiber, F.², Author
Kelsch, M.^{3, 4}, Author
Carstanjen, H. D.^{5, 6}, Author
Dosch, H.^{1, 7}, Author
Seeck, O. H.⁸, Author

Affiliations:
1Dept. Metastable and Low-Dimensional Materials, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497645
2Dept. Phase Transformations; Thermodynamics and Kinetics, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497644
3Former Dept. Microstructure Interfaces, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497657
4Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497669
5Former Central Scientific Facility Pelletron Accelerator, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497653
6Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497648
7Universität Stuttgart, Institut für Theoretische und Angewandte Physik, ou_persistent22
8Institut für Angewandte und Theoretische Physik, Universität Stuttgart, Pfaffenwaldring 57, 70550 Stuttgart, IFF, FZ Jülich GmbH, 52425 Jülich, Hasylab at DESY, Notkestrasse 85, 22603 Hamburg, ou_persistent22

Content

show

hide

Free keywords: MPI für Metallforschung; Abt. Dosch; Abt. Rühle; Abt. Schütz; ZWE Hochspannungs-Mikroskopie; ZWE Peletron-Beschleuniger;

Abstract: -

Details

show

hide

Language(s): eng - English

Dates: Date issued: 2003-05-01

Publication Status: Issued

Pages: -

Publishing info: -

Table of Contents: -

Rev. Type: -

Identifiers: eDoc: 49867

Degree: -

Event

show

Legal Case

show

Project information

show

Source 1

show

hide

Title: Journal of Applied Physics

Source Genre: Journal

Creator(s):

Affiliations:

Publ. Info: -

Pages: - Volume / Issue: 93 (9) Sequence Number: - Start / End Page: 5201 - 5209 Identifier: -