Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films

Legros, M.; Kaouache, B.; Gergaud, P.; Thomas, O.; Dehm, G.; Balk, T. J.; Arzt, E.

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Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films

Legros, M., Kaouache, B., Gergaud, P., Thomas, O., Dehm, G., Balk, T. J., et al. (2005). Pipe-diffusion ripening of Si precipitates in Al-0.5% Cu-1%Si thin films. Philosophical Magazine, 85, 3541-3552.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2854-7 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-0010-2855-5

Genre: Journal Article

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Creators:
Legros, M.¹, Author
Kaouache, B.¹, Author
Gergaud, P.¹, Author
Thomas, O.¹, Author
Dehm, G.², Author
Balk, T. J.², Author
Arzt, E.^{2, 3}, Author

Affiliations:
1CNRS, CEMES, Toulouse, F-31055 France; ENSAM, LPMM, Metz, F-57078 France; Univ. Stuttgart, Institut für Metallkunde, Stuttgart; Univ. Kentucky, Dept. Chem. & Mat. Engn.,Lexington, KY 40506 USA, ou_persistent22
2Former Dept. Micro/Nanomechanics of Thin Films and Biological Systems, Max Planck Institute for Intelligent Systems, Max Planck Society, ou_1497655
3Universität Stuttgart, Institut für Metallkunde, ou_persistent22

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Free keywords: MPI für Metallforschung; Abt. Arzt;

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Language(s): eng - English

Dates: Date issued: 2005

Publication Status: Issued

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Rev. Type: Peer

Identifiers: eDoc: 242444

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Title: Philosophical Magazine

Source Genre: Journal

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Pages: - Volume / Issue: 85 Sequence Number: - Start / End Page: 3541 - 3552 Identifier: -