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  Influence of Ar, Kr, and Xe layers on the energies and lifetimes of image-potential states on Cu(100)

Berthold, W., Rebentrost, F., Feulner, P., & Höfer, U. (2004). Influence of Ar, Kr, and Xe layers on the energies and lifetimes of image-potential states on Cu(100). Applied Physics A: Materials Science A& Processing, 78(2), 131-140. doi:10.1007/s00339-003-2310-6.

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Item Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-BF72-6 Version Permalink: https://hdl.handle.net/11858/00-001M-0000-000F-BF73-4
Genre: Journal Article

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 Creators:
Berthold, W., Author
Rebentrost, Frank1, Author           
Feulner, P., Author
Höfer, Ulrich1, Author           
Affiliations:
1Laser Chemistry, Max Planck Institute of Quantum Optics, Max Planck Society, ou_1445565              

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Language(s): eng - English
 Dates: 2004-01
 Publication Status: Issued
 Pages: -
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 Table of Contents: -
 Rev. Type: Peer
 Identifiers: eDoc: 213624
URI: http://www.springerlink.com/link.asp?id=9ch2xhtmcg1l6pe1
DOI: 10.1007/s00339-003-2310-6
Other: 2762
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Title: Applied Physics A: Materials Science A& Processing
  Alternative Title : Appl. Phys. A
Source Genre: Journal
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Publ. Info: -
Pages: - Volume / Issue: 78 (2) Sequence Number: - Start / End Page: 131 - 140 Identifier: -